Application of luminescence imaging based series resistance measurement methods in an industrial environment

In this work the applicability of the recently proposed luminescence based series resistance measurement methods on typical cell processing problems in industry is investigated. The experimentally determined values of different methods are compared on mono- and multicrystalline cells. The method RsPL based on PL imaging shows the best results on multi material. In a second step it is tested whether the Rs values obtained with RsPL allow quantitative conclusions about the influence of high local series resistances on solar cell efficiency. Therefore a new procedure based on a simple network model is introduced to calculate global values from the Rs images. The values obtained with this procedure show only a slightly different correlation to the fill factor than it is theoretically expected. Finally, it is concluded from investigations of the impact of reduced measurement times that an inline measurement with quantitative reliable results is possible with data acquisition times of <1s.