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  4. Benchmark of rigorous methods for electromagnetic field simulations
 
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2008
  • Konferenzbeitrag

Titel

Benchmark of rigorous methods for electromagnetic field simulations

Abstract
We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO.With the combined tools we investigate the convergence of near-field and far-field results for different DUV masks. We also benchmark results obtained with the waveguide-method EMF solver included in Dr.LiTHO and with the finite-element-method EMF solver JCMsuite. We demonstrate results on convergence for dense and isolated hole arrays, for masks including diagonal structures, and for a large 3D mask pattern of lateral size 10 microns by 10 microns.
Author(s)
Burger, S.
Zschiedrich, L.
Schmidt, F.
Evanschitzky, P.
Erdmann, A.
Hauptwerk
Photomask technology 2008
Konferenz
Conference on Photomask Technology 2008
International Symposium on Photomask Technology 2008
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DOI
10.1117/12.801248
Language
Englisch
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