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  4. Upcoming challenges for process modeling
 
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2007
Conference Paper
Title

Upcoming challenges for process modeling

Other Title
Aufkommende Anforderungen für die Modellbildung von Prozessen
Abstract
In industrial environments, numerical simulation has become an indispensable tool for the development and optimization of especially front-end processes. In order to remain useful for future technology nodes, process simulation has to follow and partly even anticipate paradigm shifts of state-of-the-art processes and new materials for future nanoelectronic devices. Within this article, the author presents his personal view of unsolved and upcoming issues that have to be addressed and solved in future.
Author(s)
Pichler, P.  orcid-logo
Mainwork
Simulation of Semiconductor Processes and Devices, SISPAD 2007  
Conference
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 2007  
DOI
10.1007/978-3-211-72861-1_20
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • process modeling

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