• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Aerial image analysis for defective masks in optical lithography
 
  • Details
  • Full
Options
2005
Conference Paper
Title

Aerial image analysis for defective masks in optical lithography

Abstract
The quality of photomasks in optical lithography is important for the quality of the wafer printing process. Lithography simulation software can be used to compute the influence of mask defects on the aerial or resist image of lithographic processes. The influence of various defect types and defect sizes can be compared and defect severity lists can be established. To investigate the quality of wafer images in current optical lithography different experimental tools such as AIMS and SEM are used to measure mask and wafer structures. Furthermore, it is possible to compare experimental and computational investigations and to calibrate the simulation models for future technology nodes.
Author(s)
Graf, T.
Erdmann, A.  
Evanschitzky, P.  
Tollkühn, B.
Eggers, K.
Ziebold, R.
Teuber, S.
Höllein, I.
Mainwork
Conference on Lasers and Electro-Optics Europe 2005  
Conference
Conference on Lasers and Electro-Optics Europe (CLEO Europe) 2005  
DOI
10.1109/CLEOE.2005.1568228
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024