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Correlation analysis: A fast and reliable method for a better understanding of simulation models in optical lithography
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2005
Conference Paper
Title
Correlation analysis: A fast and reliable method for a better understanding of simulation models in optical lithography
Author(s)
Tollkühn, B.
Heubner, A.
Elian, K.
Ruppenstein, B.
Erdmann, A.
Mainwork
Data analysis and modeling for process control II
Conference
Conference "Data Analysis and Modeling for Process Control" 2005
DOI
10.1117/12.599390
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
