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  4. Simplified resist models for efficient simulation of contact holes and line ends
 
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2005
  • Konferenzbeitrag

Titel

Simplified resist models for efficient simulation of contact holes and line ends

Author(s)
Tollkühn, B.
Erdmann, A.
Semmler, A.
Nölscher, C.
Hauptwerk
Micro and Nano Engineering 2004. Proceedings of the 30th International Conference on Micro and Nano Engineering
Konferenz
International Conference on Micro and Nano Engineering (MNE) 2004
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DOI
10.1016/j.mee.2004.12.065
Language
Englisch
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