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Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
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2005
Konferenzbeitrag
Titel
Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
Author(s)
Bisschop, P. de
Erdmann, A.
Rathsfeld, A.
Hauptwerk
Optical microlithography XVIII. Vol.1
Konferenz
Conference Optical Microlithography 2005
DOI
10.1117/12.599792
Language
Englisch
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