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  4. Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
 
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2005
Conference Paper
Title

Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography

Author(s)
Bisschop, P. de
Erdmann, A.  
Rathsfeld, A.
Mainwork
Optical microlithography XVIII. Vol.1  
Conference
Conference Optical Microlithography 2005  
DOI
10.1117/12.599792
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
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