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  4. Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
 
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2005
  • Konferenzbeitrag

Titel

Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography

Author(s)
Bisschop, P. de
Erdmann, A.
Rathsfeld, A.
Hauptwerk
Optical microlithography XVIII. Vol.1
Konferenz
Conference Optical Microlithography 2005
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DOI
10.1117/12.599792
Language
Englisch
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