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Towards automatic mask and source optimization for optical lithography
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2004
Conference Paper
Title
Towards automatic mask and source optimization for optical lithography
Author(s)
Erdmann, A.
Fühner, T.
Schnattinger, T.
Tollkühn, B.
Mainwork
Optical microlithography XVII. Vol.2
Conference
Conference "Optical Microlithography" 2004
DOI
10.1117/12.533215
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
