• English
  • Deutsch
  • Log In
    Password Login
    Have you forgotten your password?
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Crack propagation of silicon by hybrid tight-binding molecular dynamics
 
  • Details
  • Full
Options
2004
Conference Paper
Title

Crack propagation of silicon by hybrid tight-binding molecular dynamics

Abstract
Highly strained crack-tip fiel of silicon is analyzed using hybridized computational scheme coupling with the order N tight-binding (TB) method and the empirical modified Tersoff potential. The modeling on the treatment of so-called ghost forces description in the whole system is formulated. In order to eliminate the initial residual stresses due to mismatching the equilibrium properties between t wo schemes, the empirical Tersoff potential parameter set is refitted by the simulated annealing method. Inspecting numerical conformity of the coupling region, it is applied to solve the crack propagation problem in silicon to discuss the effect of the boundary constraints to the anoisotropic propagation on the (110) crack surface dependent on the crack propagation direction.
Author(s)
Shibutani, Y.
Hori, N.
Ogata, S.
Gumbsch, P.
Mainwork
Second International Conference on Multiscale Materials Modeling, MMM-II . Conference Proceedings  
Conference
International Conference on Multiscale Materials Modeling (MMM) 2004  
Language
English
Fraunhofer-Institut für Werkstoffmechanik IWM  
Keyword(s)
  • crack propagation

  • quasicrystal

  • molecular dynamic

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024