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2004
Conference Paper
Title

Genetic algorithm for optimization and calibration in process simulation

Other Title
Genetischer Algorithmus zur Optimierung und Kalibrierung in der Prozeßsimulation
Abstract
This paper proposes the use of genetic algorithms for process optimization and calibration of model parameters. The main principles of these evolution inspired optimizers are briefly explained. Afterwards, their application to two process simulation tasks is presented: (1) a layout problem in lithography processes and (2) the extraction of physical parameters of a diffusion model. The obtained results are shortly discussed.
Author(s)
Fühner, T.
Erdmann, A.  
Ortiz, C.J.
Lorenz, J.  
Mainwork
Simulation of Semiconductor Processes and Devices 2004  
Conference
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 2004  
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Keyword(s)
  • genetic algorithm

  • process simulation

  • calibration

  • diffusion model

  • lithography simulation

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