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  4. Influence of Mg doping profile on the electroluminescence properties of GaInN multiple quantum well light emitting diodes
 
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2004
Conference Paper
Title

Influence of Mg doping profile on the electroluminescence properties of GaInN multiple quantum well light emitting diodes

Other Title
Einfluß des Mg-Dotierprofils auf die Elektrolumineszenzeigenschaften von GaInN Multi-Quantenfilm Lichtemittiernden Dioden
Abstract
The influence of the Mg doping profile on the electroluminescence efficiency of GaInN light emitting diodes (LED) has been investigated. The Mg doping profile is influenced by segregation as well as by diffusion during the growth. The diffusion of the Mg dopants into the active region can be controlled by the growth temperature of the Mg doped layers. An increase in Mg concentration close the active region results in an improved hole injection and thus in a higher electroluminescence efficiency of the GaInN quantum wells. However an excessive spread of the Mg doping atoms towards the GaInN quantum well active region leads to nonradiative recombination and thus a lower output power of the LEDs. An LED test structure containing multiple quantum wells which differ in In content and emission wavelength was used to probe the spatial distribution of the radiative recombination of electrons and holes in the active region and to clarify the influence of Mg dopants in the active region on nonradiative recombination.
Author(s)
Stephan, T.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Köhler, Klaus  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Maier, M.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Kunzer, Michael  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Schlotter, P.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Wagner, J.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mainwork
Light-emitting diodes: Research, manufacturing, and applications VIII  
Conference
Conference "Light-Emitting Diodes - Research, Manufacturing, and Applications" 2004  
DOI
10.1117/12.527684
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • group III-nitrides

  • Gruppe III-Nitride

  • semiconductor

  • Halbleiter

  • heterostructure

  • Heterostruktur

  • optoelectronic device

  • optoelektronisches Bauelement

  • devices

  • Bauelement

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