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Do we need complex resist models for predictive simulation of lithographic process performance?
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2004
Konferenzbeitrag
Titel
Do we need complex resist models for predictive simulation of lithographic process performance?
Author(s)
Tollkühn, B.
Erdmann, A.
Lammers, J.
Nolscher, C.
Semmler, A.
Hauptwerk
Advances in resist technology and processing XXI. Vol.2
Konferenz
Conference "Advances in Resist Technology and Processing" 2004
DOI
10.1117/12.534045
Language
Englisch
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