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Do we need complex resist models for predictive simulation of lithographic process performance?
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2004
Conference Paper
Title
Do we need complex resist models for predictive simulation of lithographic process performance?
Author(s)
Tollkühn, B.
Erdmann, A.
Lammers, J.
Nolscher, C.
Semmler, A.
Mainwork
Advances in resist technology and processing XXI. Vol.2
Conference
Conference "Advances in Resist Technology and Processing" 2004
DOI
10.1117/12.534045
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
