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Rigorous simulation of defective EUV multilayer masks
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2003
Conference Paper
Title
Rigorous simulation of defective EUV multilayer masks
Author(s)
Sambale, C.
Schmöller, T.
Erdmann, A.
Evanschitzky, P.
Kalus, C.
Mainwork
23rd Annual BACUS Symposium on Photomask Technology 2003. Pt.2
Conference
Symposium on Photomask Technology 2003
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
