English
Deutsch
Log In
Log in with Fraunhofer Smartcard
Password Login
Research Outputs
Fundings & Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Konferenzschrift
Rigorous simulation of defective EUV multilayer masks
Details
Full
Export
Statistics
Options
Show all metadata (technical view)
2003
Conference Paper
Title
Rigorous simulation of defective EUV multilayer masks
Author(s)
Sambale, C.
Schmöller, T.
Erdmann, A.
Evanschitzky, P.
Kalus, C.
Mainwork
23rd Annual BACUS Symposium on Photomask Technology 2003. Pt.2
Conference
Symposium on Photomask Technology 2003
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
