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  4. Advanced RTP-process for boron-doped and oxygen contaminated Cz silicon
 
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2002
Conference Paper
Title

Advanced RTP-process for boron-doped and oxygen contaminated Cz silicon

Abstract
An improvement of the stable carrier lifetime was achieved by Rapid Thermal Processing (RTP). On three different Cz materials and a FZ material the influence of the plateau temperature on the stable lifetime was investigated. At plateau temperatures below 900 °C, the carrier lifetime can be improved using an optimized process whereas at temperatures above 900 °C, the carrier lifetime is decreased not only for all Cz materials but also for FZ materials. Interestingly, in two subsequent high-temperature steps the last step determines the stable carrier lifetime and the degraded stable lifetime due to a first step can be reversed by an optimized second step. The effect of such process sequences on the standard RTP-solar cell has been analyzed.
Author(s)
Lee, J.Y.
Peters, S.
Dicker, Jochen
Rein, Stefan  
Glunz, Stefan W.  
Mainwork
17th European Photovoltaic Solar Energy Conference 2001. Vol.2  
Conference
European Photovoltaic Solar Energy Conference 2001  
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
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