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  4. Extraction of vacancy parameters from outdiffusion of zinc from silicon
 
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1999
Conference Paper
Title

Extraction of vacancy parameters from outdiffusion of zinc from silicon

Other Title
Extraktion von Gitterleerstellenparametern durch Ausdiffusion von Zink aus Silicium
Abstract
A final determination of the equilibrium concentrations and diffusion coefficients of intrinsic point defects has been the goal of various investigations since decades. In a series of papers, Giese et al. claimed that outdiffusion of zinc at a temperature of 1107 °C can be explained only by a vacancy equilibrium concentration of the order of 1E15 cm-3. The assumption of such a high equilibrium concentration has a long tradition. However, it is in contrast to models for crystal growth and some of our results on platinum diffusion. A numerical investigation based on the zinc-outdiffusion profiles of Giese et al. resulted in the conclusion that these profiles can be explained also by significantly lower vacancy equilibrium concentrations.
Author(s)
Pichler, P.  orcid-logo
Mainwork
Gettering and Defect Engineering in Semiconductor Technology. Proceedings of the 8th International Autumn Meeting  
Conference
International Autumn Meeting Gettering and Defect Engineering in Semiconductor Technology (GADEST) 1999  
Language
German
IIS-B  
Keyword(s)
  • diffusion

  • Gitterleerstelle

  • Gleichgewichtskonzentration

  • silicium

  • Zink

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