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Optimization of critical ion implantation steps in 0.18 mu m CMOS technology
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1998
Conference Paper
Title
Optimization of critical ion implantation steps in 0.18 mu m CMOS technology
Author(s)
Burenkov, A.
Fraunhofer-Institut für Integrierte Schaltungen IIS
Wittl, J.
Schwalke, U.
Lorenz, J.
Ryssel, H.
Mainwork
ESSDERC '98
Conference
European Solid-State Device Research Conference (ESSDERC) 1998
Language
English
IIS-B
