• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Monte-Carlo simulation of silicon amorphization during ion implantation
 
  • Details
  • Full
Options
1997
Conference Paper
Title

Monte-Carlo simulation of silicon amorphization during ion implantation

Other Title
Monte-Carlo-Simulation von Silicium-Amorphisierung bei Ionenimplantation
Author(s)
Bohmayr, W.
Burenkov, A.  
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Lorenz, J.  
Ryssel, H.
Selberherr, S.
Mainwork
International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96  
Conference
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 1996  
Language
English
IIS-B  
Keyword(s)
  • Amorphisierung

  • amorphization

  • Halbleitertechnologie

  • ion implantation

  • Ionenimplantation

  • Monte-Carlo simulation

  • process simulation

  • Prozeßsimulation

  • semiconductor technology

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024