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  4. Atomistic evaluation of diffusion theories for the diffusion of dopants in vacancy gradients
 
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1993
Conference Paper
Title

Atomistic evaluation of diffusion theories for the diffusion of dopants in vacancy gradients

Abstract
A new approach is used for the calculation of transport coefficients for dopants and vacancies from atomic jump frequencies in the presence of dopant or vacancy gradients. Results are shown for the diffusion under vacancy gradients with an attractive potential between the dopant and the defect. It is demonstrated that for a given vacancy gradient not only the absolute value but also the sign of the dopant flux depends on the range of the binding potential.
Author(s)
List, S.
Pichler, P.  orcid-logo
Ryssel, H.
Mainwork
Simulation of semiconductor devises and processes  
Conference
International Conference on Simulation of Semiconductor Devices and Processes (SISDEP) 1993  
Language
English
IIS-B  
Keyword(s)
  • Diffusionsmechanismus

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