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  4. SIMOX, an efficient etch-stop to fabricate silicon membranes with well defined thickness. Part 1
 
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1992
Conference Paper
Titel

SIMOX, an efficient etch-stop to fabricate silicon membranes with well defined thickness. Part 1

Author(s)
Dura, H.-G.
Gassel, H.
Mokwa, W.
Vogt, H.
Hauptwerk
Electrochemical Society Meeting '92. Extended Abstracts
Konferenz
Electrochemical Society (Meeting) 1992
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Language
English
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Fraunhofer-Institut für Mikroelektronische Schaltungen und Systeme IMS
Tags
  • Ätzen

  • buried oxide

  • epitaxial layer

  • Epitaxialschicht

  • etch stop

  • etching

  • Membran

  • Membranes

  • SIMOX

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