Controlled plasma-chemical deposition of polymer films from a liquid monomer

A reaction chamber for plasma deposition, designed in view of industrial plasma processes, has been tested by plasma polymerization of tetramethoxysilane/oxygen mixtures on polycarbonate substrates. Deposition rates have been measured as a function of parameters such as total pressure, gas flows, and the substrate coordinates in relation to the electrode dimensions. The polymeric films are characterized by IR- spectroscopy, ESCA, and thickness measurements.