• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Simulation of complete process step sequences in silicon technology
 
  • Details
  • Full
Options
1989
Conference Paper
Title

Simulation of complete process step sequences in silicon technology

Abstract
Since the publication of the first one-dimensional process simulation programs, increasing activities have been carried out in the development and improvement of the physical models involved and the development of more general programs which may be used for simulations in two or three dimensions. In this paper, some aspects of recent work carried out at FhG-AIS are discussed.
Author(s)
Pichler, P.  orcid-logo
Lorenz, J.  
Mainwork
Simulation applied to manufacturing energy and environmental studies and electronics and computer engineering. Proceedings of the 1989 European Simulation Multiconference  
Conference
European Simulation Multiconference (ESM) 1989  
Language
English
IIS-B  
Keyword(s)
  • diffusion

  • ion implantation

  • Ionenimplantation

  • oxidation

  • process simulation

  • Prozeßsimulation

  • simulation program

  • Simulationsprogramm

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024