Verfahren zur Herstellung einer Hartstoffbeschichtung auf metallischen, keramischen oder hartmetallischen Bauteilen sowie eine mit dem Verfahren hergestellte Hartstoffbeschichtung

Producing a hard material coating on metallic, ceramic or hard-metallic components, in which e.g. aluminum chromium nitride, aluminum chromium silicon nitride, aluminum titanium nitride or aluminum chromium silicon nitride/zirconium nitride is formed and have a layer thickness of at least 50 mu m, using a physical vapor deposition (PVD) method, in which within a vacuum chamber, in which a nitrogen partial pressure of greater than 2.5 (preferably greater than 5) Pa is maintained, contains at least one of metallic elements in the coating, and a silicon is contained in the coating, is claimed. Producing a hard material coating on metallic, ceramic or hard-metallic components, in which aluminum chromium nitride, aluminum chromium silicon nitride, aluminum titanium nitride, aluminum titanium silicon nitride, aluminum chromium nitride/titanium nitride, aluminum titanium silicon nitride/titanium nitride, aluminum chromium nitride/zirconium nitride or aluminum chromium silicon nitride/zirconium nitride is formed and have a layer thickness of at least 50 mu m, using a PVD method, in which within a vacuum chamber, in which a nitrogen partial pressure of greater than 2.5 (preferably greater than 5) Pa is maintained, contains at least one of the metallic elements in the coating, and a silicon is contained in the coating, is claimed, where a silicon-containing vapor source is operated to form the coating on the component surface, and an electrically negative bias voltage of at least 250 (preferably 500) V is applied at least during the formation of the coating to the component to be coated. An independent claim is included for the hard material coating manufactured by the above method, where the coating has a hardness of at least 2500 HV, thus the residual stress of the coating is less than 2 GPa and a fine crystalline structure with a grain size of smaller than 100 nm is observed and within the coating, the proportion of individual chemical elements forming the coating are varied.