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Patent
Title

Verfahren zur Herstellung eines Siliziumschicht

Other Title
METHOD FOR PRODUCING A SILICON LAYER
Abstract
The invention relates to a method for producing a silicon layer, wherein silicon nanoparticles are sintered using a catalyst, preferably nickel. In said method, nanoparticles containing or made of silicon are applied to a substrate, the nanoparticles are brought together with nickel or a compound containing nickel, and then the nanoparticles and the nickel or the compound containing nickel are heated in such a way that a continuous silicon layer is produced by means of tempering.
Inventor(s)
Jank, M.  
Lukas, S.
Link to Espacenet
http://worldwide.espacenet.com/publicationDetails/biblio?DB=worldwide.espacenet.com&locale=en_EP&FT=D&CC=DE&NR=102011008263A
Patent Number
102011008263
Publication Date
2011
Language
German
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
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