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  4. Atmospheric Pressure Dry Etching of Polysilicon Layers for highly Reverse Bias-stable TOPCon Solar Cells
 
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2022
Journal Article
Title

Atmospheric Pressure Dry Etching of Polysilicon Layers for highly Reverse Bias-stable TOPCon Solar Cells

Abstract
Single-sided etching (SSE) of a-Si/poly-Si is typically considered a challenge for realizing a cost-efficient TOPCon production sequence, as there is a certain degree of unwanted wrap-around for poly-Si deposition technologies such as low pressure chemical vapor deposition, plasma-enhanced chemical vapor deposition, and atmospheric pressure chemical vapor deposition. To date, alkaline or acidic wet-chemical solutions in either inline or batch configurations are used for this purpose. Herein, an alternative SSE process is proposed using an inline dry etching tool, which applies molecular fluorine as the etching gas under atmospheric pressure conditions. The developed etching process performs complete etching of both as-deposited amorphous silicon and annealed polycrystalline silicon layers, either intrinsic or doped, and with measured etch rates of >3 μm min-1 at 10% F2 concentration allows etching of a typical layer thickness of 200 nm in just a few seconds. The etching process is also configured to perform excellent edge isolation while maintaining a low wrap-around etching (d rear < 500 μm) at the opposing-side. The etching process is successfully transferred to the industrial TOPCon solar cell architecture, yielding high parallel resistances (S shunt,avg. > 1500 kΩ cm2), low reverse current density (J rev,avg < 0.8 mA cm-2) measured at a bias voltage of -12 V, and independently certified conversion efficiencies of up to 23.3%.
Author(s)
Kafle, Bishal  
Fraunhofer-Institut für Solare Energiesysteme ISE  
Mack, Sebastian  
Fraunhofer-Institut für Solare Energiesysteme ISE  
Teßmann, Christopher  
Fraunhofer-Institut für Solare Energiesysteme ISE  
Bashardoust, Sattar
Fraunhofer-Institut für Solare Energiesysteme ISE  
Clochard, Laurent
Duffy, Edward
Wolf, Andreas  
Fraunhofer-Institut für Solare Energiesysteme ISE  
Hofmann, Marc  
Fraunhofer-Institut für Solare Energiesysteme ISE  
Rentsch, Jochen  
Fraunhofer-Institut für Solare Energiesysteme ISE  
Journal
Solar RRL  
Conference
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) 2021  
Open Access
DOI
10.24406/publica-r-269891
10.1002/solr.202100481
File(s)
N-640767.pdf (2.52 MB)
Rights
CC BY 4.0: Creative Commons Attribution
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
Keyword(s)
  • Photovoltaik

  • etching process

  • silicon solar cell

  • TOPCon

  • Silicium-Photovoltaik

  • Charakterisierung von Prozess- und Silicium-Materialien

  • Pilotherstellung von industrienahen Si-Solarzellen

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