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  4. Black and white fused silica: Modified sol-gel process combined with moth-eye structuring for highly absorbing and diffuse reflecting SiO2 glass
 
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2020
Journal Article
Title

Black and white fused silica: Modified sol-gel process combined with moth-eye structuring for highly absorbing and diffuse reflecting SiO2 glass

Abstract
Diffuse reflecting (white) and highly absorbing (black) fused silica based materials are presented, which combine volume modified substrates and surfaces equipped with antireflective moth-eye-structures. For diffuse reflection, micrometer sized cavities are created in bulk fused silica during a sol-gel process. In contrast, carbon black particles are added to get the highly absorbing material. The moth-eye-structures are prepared by block copolymer micelle nanolithography (BCML), followed by a reactive-ion-etching (RIE) step. The moth-eye-structures drastically reduce the specular reflectance on both diffuse reflecting and highly absorbing samples across a wide spectral range from 250 nm to 2500 nm and for varying incidence angles. The adjustment of the height of the moth-eye-structures allows us to select the spectral position of the specular reflectance minimum, which measures less than 0.1%. Diffuse Lambertian-like scattering and absorbance appear nearly uniform across the selected spectral range, showing a slight decrease with increasing wavelength.
Author(s)
Brunner, R.
Kraus, M.
Hirte, J.
Diao, Z.
Weishaupt, K.
Spatz, J.P.
Harzendorf, T.
Trost, M.
Munser, A.S.
Schröder, S.
Bär, M.
Journal
Optics Express  
Open Access
DOI
10.1364/OE.406150
Additional full text version
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Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • Block Copolymery

  • carbon black

  • micelles

  • reactive ion etching

  • reflection

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