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  4. Modeling of the impact of the substrate voltage on the capacitances of GaN-on-Si HEMTs
 
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2019
Journal Article
Title

Modeling of the impact of the substrate voltage on the capacitances of GaN-on-Si HEMTs

Abstract
Measurement results of the terminal capacitances of a high-voltage power GaN high-electron-mobility transistor on a conductive-Si substrate are presented. These results show significant dependence of these capacitances on the substrate (or bulk/backside) voltage. In this article, we enhance the ASM-GaN compact model, which is a recently selected industry standard model for GaN devices, to account for this dependence. A detailed description of the modeling procedure is presented. Simulation results based on the enhanced model are in excellent agreement with measurement results. The model enables the design of advanced high-voltage GaN power ICs, such as half-bridges with drivers and logic, on a conductive Si-substrate, taking capacitive substrate coupling into account during simulations.
Author(s)
Albahrani, Sayed Ali  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Mahajan, Dhawal
Macquarie University, Sydney
Mönch, Stefan  orcid-logo
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Reiner, Richard  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Waltereit, Patrick  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Schwantuschke, Dirk  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Khandelwal, Sourabh
Macquarie University, Sydney
Journal
IEEE transactions on electron devices  
DOI
10.1109/TED.2019.2948828
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • Capacitance-voltage (CV) characteristics

  • compact models

  • gallium nitride

  • high-electron-mobility transistor (HEMT)

  • physics-based models

  • power semiconductor device

  • semiconductor device measurement

  • semiconductor device modeling

  • substrates

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