• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Scattering-loss reduction of ridge waveguides by sidewall polishing
 
  • Details
  • Full
Options
2018
Journal Article
Title

Scattering-loss reduction of ridge waveguides by sidewall polishing

Abstract
Ridge waveguides provide a large refractive index contrast and thus strong mode confinement, making them highly attractive for building compact photonic integrated circuits. However, ridge waveguides suffer from scattering losses. We demonstrate scattering-loss reduction of ridge waveguides made of lithium-niobate-on-insulator (LNOI) substrates by more than one order of magnitude. This is achieved by gently polishing of the ridge's sidewalls and simultaneous protection of the top surfaces by a metal layer. Whispering-gallery-resonator loss measurements reveal ultra-low losses down to 0.04 dB/cm of the processed waveguides. Our approach pushes ridge waveguides further towards their fundamental absorption-loss limit, enabling highly efficient integrated devices.
Author(s)
Wolf, Richard
Univ. Freiburg
Breunig, Ingo  
Univ. Freiburg; IPM
Zappe, Hans
Univ. Freiburg
Buse, Karsten  
Fraunhofer-Institut für Physikalische Messtechnik IPM  
Journal
Optics Express  
Open Access
DOI
10.1364/OE.26.019815
Language
English
Fraunhofer-Institut für Physikalische Messtechnik IPM  
Keyword(s)
  • waveguide

  • thin film devices

  • microstructure fabrication

  • polishing

  • roughness

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024