MgF2 films prepared from solvothermally treated precursor solutions
Abstract
MgF2 coating solutions were solvothermally treated at 160 °C for different time periods, this procedure induced crystallization and particle growth. Antireflection coatings prepared on glass from these solutions were compared to films derived from untreated precursor material. Ellipsometric porosimetry (EP) was employed to characterize structural features of coatings on glass as function of annealing temperature. Based on precursor solutions that had undergone solvothermal treatment antireflective coatings with a peak transparency exceeding 99% were prepared on PMMA substrates.
