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  4. Monolithic two-terminal III-V//Si triple-junction solar cells with 30.2% efficiency under 1-Sun AM1.5g
 
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2017
Journal Article
Title

Monolithic two-terminal III-V//Si triple-junction solar cells with 30.2% efficiency under 1-Sun AM1.5g

Abstract
Stacking III-V p-n junctions on top of wafer-based silicon solar cells is a promising way to go beyond the silicon single-junction efficiency limit. In this study, triple-junction GaInP/AlxGa1-xAs//Si solar cells were fabricated using surface-activated direct wafer bonding. Metal-organic-vapor-phase-epitaxy-grown GaInP/AlxGa1-xAs top cells are bonded at low temperature to independently prepared wafer-based silicon cells. n-Si//n-GaAs interfaces were investigated and achieved bulk-like bond strength, high transparency, and conductivity homogeneously over 4-inch wafer area. We used transfer-matrix optical modeling to identify the best design options to reach current-matched two-terminal devices with different mid-cell bandgaps (1.42, 1.47, and 1.52 eV). Solar cells were fabricated accordingly and calibrated under AM1.5g 1-sun conditions. An improved Si back-side passivation process is presented, leading to a current density of 12.4 mA/cm2 (AM1.5g), measured for a flat Si cell below GaAs. The best 4 cm2 GaInP/GaAs//Si triple-junction cell reaches 30.2% 1-sun efficiency.
Author(s)
Cariou, Romain
Benick, Jan  
Beutel, Paul  
Razek, N.
Flötgen, C.
Hermle, Martin  
Lackner, David  
Glunz, Stefan W.  
Bett, Andreas W.  
Wimplinger, M.
Dimroth, Frank  
Journal
IEEE Journal of Photovoltaics  
DOI
10.1109/jphotov.2016.2629840
Link
Link
Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
Keyword(s)
  • Materialien - Solarzellen und Technologie

  • Photovoltaik

  • Silicium-Photovoltaik

  • III-V und Konzentrator-Photovoltaik

  • Epitaxie

  • Si-Folien und SiC-Abscheidungen

  • silicon

  • wafer bonding

  • triple junction solar cells

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