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  4. Preparation, characterization and wear behaviour of PACVD cermets
 
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1995
Journal Article
Title

Preparation, characterization and wear behaviour of PACVD cermets

Other Title
Herstellung, Charakterisierung und Verschleißverhalten von PACVD-Cermets
Abstract
Commercial cermets inserts were coated with TiN(x), TiC(x)N(y) and (Ti, Si)N(x) by plasma-assisted chemical vapour deposition using a pulsed d.c. glow discharge. The influence of the coating parameters on the deposition rate, layer composition, layer-substrate interface, structure and microhardness of the layers was investigated within the deposition temperatures of 773-973 K. With optimized process parameters, layers with a low oxygen and chlorine impurity, high microhardness and a good adhesive strength are obtained. Higher microhardness values compared with that of TiN(x) were observed for TiC(x)N(y) and (Ti, Si)N(x) layers depending on the layer composition. Usually, the TiN(x) and also the TiC(x)N(y) and (Ti, Si)N(x) layers with low carbon and silicon contents have a columnar structure with a (200) texture. The structure changes with rising carbon and silicon concentrations. The edge life of the insert tips is markedly increased for cast iron and steel machining.
Author(s)
Endler, Ingolf
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Wolf, E.
Institut für Festkörper- und Werkstofforschung (IFW), Dresden
Leonhardt, A.
Institut für Festkörper- und Werkstofforschung (IFW), Dresden
Richter, Volkmar
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Journal
Surface and coatings technology  
DOI
10.1016/0257-8972(94)02338-7
Language
English
Fraunhofer-Institut für Keramische Technologien und Systeme IKTS  
Keyword(s)
  • Cermet

  • chemisches Aufdampfen

  • Titannitrid

  • Carbonitrieren

  • Verfahrensparameter

  • Adhäsion

  • Mikrohärte

  • Textur

  • Kristallorientierung

  • chemische Zusammensetzung

  • Sauerstoffgehalt

  • Chlor

  • Schneide

  • Kantenverschleiß

  • Verfahrensbedingung

  • Sauerstoff

  • Konzentrationseinfluss

  • Titancarbonitrid

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