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  4. Transfer-free grown bilayer graphene transistors for digital applications
 
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2013
Journal Article
Titel

Transfer-free grown bilayer graphene transistors for digital applications

Abstract
We invented a novel method to fabricate graphene transistors on oxidized silicon wafers without the need to transfer graphene layers. By means of catalytic chemical vapor deposition (CCVD) the in situ grown bilayer graphene transistors (BiLGFETs) are realized directly on oxidized silicon substrate, whereby the number of stacked graphene layers is determined by the selected CCVD process parameters, e.g. temperature and gas mixture. BiLGFETs exhibit ultra-high on/off-current ratios of 10(7) at room temperature, exceeding previously reported values by several orders of magnitude. This will allow a simple and low-cost integration of graphene devices for digital nanoelectronic applications in a hybrid silicon CMOS environment for the first time.
Author(s)
Wessely, P.J.
Wessely, F.
Birinci, E.
Riedinger, B.
Schwalke, U.
Zeitschrift
Solid-State Electronics
Project(s)
ELOGRAPH
Funder
Deutsche Forschungsgemeinschaft DFG
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DOI
10.1016/j.sse.2012.12.008
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Language
English
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Fraunhofer-Institut für Werkstoffmechanik IWM
Tags
  • bilayer graphene tran...

  • transfer-free growth ...

  • ultra-high on/off-cur...

  • full silicon CMOS com...

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