Photon Management Structures Based on Interference Lithography

Since micro- and nanostructures for photon management are of increasing importance in novel high-efficiency solar cell concepts, structuring techniques with up-scaling potential play a key role in their realization. Interference lithography and Nanoimprint processes are presented as technologies for origination and replication of fine-tailored photonic structures on large areas. The combination of these processes is presented as feasible route to generate high efficiency honeycomb textures on multicrystalline silicon.