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  4. Photon Management Structures Based on Interference Lithography
 
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2011
Journal Article
Titel

Photon Management Structures Based on Interference Lithography

Titel Supplements
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Abstract
Since micro- and nanostructures for photon management are of increasing importance in novel high-efficiency solar cell concepts, structuring techniques with up-scaling potential play a key role in their realization. Interference lithography and Nanoimprint processes are presented as technologies for origination and replication of fine-tailored photonic structures on large areas. The combination of these processes is presented as feasible route to generate high efficiency honeycomb textures on multicrystalline silicon.
Author(s)
Bläsi, B.
Hauser, H.
Walk, C.
Michl, B.
Kübler, V.
Wolf, A.J.
Zeitschrift
Future Photovoltaics. Online journal (Nicht mehr online verfügbar)
File(s)
N-212591.pdf (693.04 KB)
Language
English
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Fraunhofer-Institut für Solare Energiesysteme ISE
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  • Solarthermie und Opti...

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