2009
Journal Article
Title

Deposition of niobium nitride thin films from Tert-Butylamido-Tris-(Diethylamido)-Niobium by a modified industrial MOCVD reactor

Author(s)
Thiede, T.B.
Parala, H.
Reuter, K.
Passing, G.
Kirchmeyer, S.
Hinz, J.
Lemberger, M.
Bauer, A.J.
Barreca, D.
Gasparotto, A.
Fischer, R.A.
Journal
DOI
Language
English