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Rigorous electromagnetic field mask modeling and related lithographic effects in the low k(1) and ultrahigh numerical aperture regime
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2007
Journal Article
Title
Rigorous electromagnetic field mask modeling and related lithographic effects in the low k(1) and ultrahigh numerical aperture regime
Author(s)
Erdmann, A.
Evanschitzky, P.
Journal
Journal of Microlithography, Microfabrication, and Microsystems
DOI
10.1117/1.2778447
Language
English
Fraunhofer-Institut für Integrierte Schaltungen IIS
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
