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Reactive sputter deposition of alumina thin films using a hollow cathode sputtering source
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2002
Journal Article
Title
Reactive sputter deposition of alumina thin films using a hollow cathode sputtering source
Author(s)
Pradhan, A.
Shah, S.I.
Unruh, K.M.
Journal
Review of scientific instruments
DOI
10.1063/1.1512340
Language
English
Fraunhofer-Institut für Fertigungstechnik und Angewandte Materialforschung IFAM
