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Nanocomposite resist systems for next-generation lithography
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2002
Journal Article
Title
Nanocomposite resist systems for next-generation lithography
Author(s)
Merhari, L.
Gonsalves, K.E.
Hu, Y.
He, W.
Huang, W.S.
Angelopoulos, M.
Bruenger, W.H.
Dzionk, C.
Torkler, M.
Journal
Microelectronic engineering
DOI
10.1016/S0167-9317(02)00554-3
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT