Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings
Abstract
The fabrication of micro-optical elements by electron-beam lithography and dry etching technique using a top conductive coating is presented. This conductive layer prevents the occurrence of charging effects during electron-beam exposure. Several different structures, mainly for use in micro-optics using various resist types, were realised in dielectric substrates. The use of top conductive coatings proved to be practical, reliable and simple.
