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Electrical reliability aspects of through the gate implanted MOS-structures with thin oxides
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2001
Journal Article
Title
Electrical reliability aspects of through the gate implanted MOS-structures with thin oxides
Author(s)
Jank, M.
Lemberger, M.
Bauer, A.J.
Frey, L.
Ryssel, H.
Journal
Microelectronics reliability
DOI
10.1016/S0026-2714(01)00053-1
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
