• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. 3D-electromagnetic field simulation for Low-k1 lithography applications
 
  • Details
  • Full
Options
2001
Journal Article
Title

3D-electromagnetic field simulation for Low-k1 lithography applications

Other Title
3D-elektromagnetische Feldsimulation für Lithographieanwendungen mit kleinem k1
Abstract
Optical simulation programs that solve Maxwell´s equations can explain three dimensional effects on advanced photomasks that impact real world lithography, especially when using alternating phase-shift masks.
Author(s)
Erdmann, A.  
Gordon, R.
McCallum, M.
Rosenbusch, A.
Journal
Microlithography World  
Language
English
IIS-B  
Keyword(s)
  • optische Lithographie

  • simulation

  • rigorose Beugungstheorie

  • Phasenmaske

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024