Surface characterization of optical components for the DUV, VUV und EUV

Total light scattering measurements (TS) at 248 nm, 193 nm and 157 nm, atomic force microscopy (AFM) and X-ray scattering (XRS) are used to characterize optical components for the DUV/VUV and EUV regions. Power spectral densities (PSD) were calculated for comprehensive roughness analysis. Examples of measurements on CaF, substrates and fluoride multilayer coatings for DUV/VUV applications as well as on Mo films for use in EUV optics are presented.