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  4. Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode
 
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2001
Journal Article
Title

Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode

Author(s)
Herden, M.
Bauer, A.J.
Beichele, M.
Ryssel, H.
Journal
Solid-State Electronics  
DOI
10.1016/S0038-1101(00)00270-7
Language
English
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
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