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  4. Deposition of SiOx films from O2/HMDSO plasmas
 
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1999
Journal Article
Title

Deposition of SiOx films from O2/HMDSO plasmas

Abstract
The variation of 02/HMDSO ratio in an r.f. plasma was carried out to optimize SiOx film properties and deposition rates for the coating of polymers. A ratio exceeding 6:1 yields scratch resistant, quartz-like films with low carbon contents. The chemical composition was analyzed to SiO(1.8)C(0.3) by XPS. A compact plasma reactor was developed generating homogeneous plasmas and depositions over large areas (up to 380 x 290 mm2). Furthermore, the total coverage of three-dimensional formed parts was managed with good adhesion of SiOx films to polymers like PC and PBT to reduce wear.
Author(s)
Hegemann, Dirk  
Vohrer, Uwe  orcid-logo
Oehr, Christian  
Riedel, R.
Journal
Surface and coatings technology  
DOI
10.1016/S0257-8972(99)00092-4
Language
English
Fraunhofer-Institut für Grenzflächen- und Bioverfahrenstechnik IGB  
Keyword(s)
  • adhesion

  • r.f.plasma

  • SiOx films

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