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  4. Monte-Carlo simulation of silicon amorphization during ion implantation
 
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1998
Journal Article
Title

Monte-Carlo simulation of silicon amorphization during ion implantation

Author(s)
Bohmayr, W.
Burenkov, A.  
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB  
Lorenz, J.  
Ryssel, H.
Selberherr, S.
Journal
IEEE transactions on computer-aided design of integrated circuits and systems  
DOI
10.1109/43.736563
Language
English
IIS-B  
Keyword(s)

  • Amorphisierung

  • amorphization

  • Halbleitertechnologie

  • ion implantation

  • Ionenimplantation

  • Monte-Carlo simulation

  • process simulation

  • Prozeßsimulation

  • semiconductor technology

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