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Energy- and angular distributions of argon neutrals and their influence on etching profiles
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1996
Journal Article
Title
Energy- and angular distributions of argon neutrals and their influence on etching profiles
Author(s)
Börnig, K.
Janes, J.
Jünemann, B.
Journal
Microelectronic engineering
DOI
10.1016/0167-9317(95)00263-4
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT
