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Ion-beam mixed ultra-thin cobalt silicide (CoSi2) films by cobalt sputtering and rapid thermal annealing
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1995
Journal Article
Title
Ion-beam mixed ultra-thin cobalt silicide (CoSi2) films by cobalt sputtering and rapid thermal annealing
Author(s)
Kal, S.
Kasko, I.
Ryssel, H.
Journal
Journal of Electronic Materials
DOI
10.1007/BF02655447
Language
English
IIS-B
