• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Artikel
  4. Atomistic evalution of diffusion theories for the diffusion of dopants in vacancy gradients
 
  • Details
  • Full
Options
1995
Journal Article
Title

Atomistic evalution of diffusion theories for the diffusion of dopants in vacancy gradients

Abstract
A new approach is used for the calculation of transport coefficients for dopants and vacancies from atomic jump frequencies in the presence of dopant or vacancy gradients. Results are shown for the diffusion under vacancy gradients with an attractive potential between the dopant and the defect. It is demonstrated that for a given vacancy gradient not only the absolute value but also the sign of the dopant flux depends on the range of the binding potential.
Author(s)
List, S.
Pichler, P.  orcid-logo
Ryssel, H.
Journal
Microelectronics journal  
DOI
10.1016/0026-2692(95)98928-K
Language
English
IIS-B  
Keyword(s)
  • Diffusionsmechanismus

  • Gitterleerstellen

  • Paardiffusion

  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024