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Simulation of the step coverage for chemical vapor deposited silicon dioxide
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1992
Zeitschriftenaufsatz
Titel
Simulation of the step coverage for chemical vapor deposited silicon dioxide
Author(s)
Wille, H.
Burte, E.P.
Ryssel, H.
Zeitschrift
Journal of applied physics
DOI
10.1063/1.350908
Language
Englisch
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