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  4. Laser patterning of SiOx-layers for the fabrication of UV diffractive phase elements
 
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2005
Conference Paper
Title

Laser patterning of SiOx-layers for the fabrication of UV diffractive phase elements

Abstract
Diffractive phase elements (DPE), consisting of a patterned UV-transparent layer on a UV-transparent substrate, were fabricated by three steps. A UV-absorbing SiOx-coating (x < 2) with a thickness matching to the required phase delay was deposited on a fused silica substrate. The coating was removed on a pixel array corresponding to a calculated two-dimensional quantized phase function (DPE-design). By a thermal annealing process the SiOx-coating was oxidised to UV-transparent SiO2, resulting in a UV-grade surface relief element.
Author(s)
Schulz-Ruhtenberg, M.
Ihlemann, J.
Heber, J.
Mainwork
4th International Conference on Photo-Excited Processes and Applications, 4-ICPEPA 2005  
Conference
International Conference on Photo Excited Processes and Applications (ICPEPA) 2004  
DOI
10.1016/j.apsusc.2005.03.096
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
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