A large area production technology for solar cells - sputter deposition of SiN:H

This paper summarizes aspects and investigations of the sputter process for industrial deposition of passivating SiN:H antireflection (AR) layers on multi-crystalline silicon solar cells. The motivation for this work was the existence of low cost mass products manufactured with sputtering technology such as coated architectural and display glass. In close cooperation with Applied Films, Fraunhofer ISE showed that sputtered nitride layers can replace the up to now used PECVD nitrides. The inherent advantages of sputtering technology such as excellent layer homogeneity, a silane-free process and long service cycles can be transferred to SiN:H deposition on solar cells. Operating figures for a newly designed inline sputter coater are presented.