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  4. Determination of scattering losses in ArF* excimer laser all-dielectric mirrors for 193 nm microlithography application
 
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2005
Conference Paper
Title

Determination of scattering losses in ArF* excimer laser all-dielectric mirrors for 193 nm microlithography application

Abstract
The complete evaluation in the selection of coating designs for production of high performance mirrors must include the scattering losses that are associated with the thin film materials combination. This is especially true for deep ultraviolet [DUV] microlithography applications. Scattering loss data are presented at 193 nm for various coating material designs for operation in argon fluoride laser systems. For overall optimum performance tradeoffs of the spectral reflectance, environmental stability and pulsed laser irradiation lifetime survivability is also discussed.
Author(s)
Rudisill, J.
Duparre, A.
Schröder, S.
Mainwork
Laser-induced damage in optical materials 2004  
Conference
Annual Boulder Damage Symposium 2004  
Annual Symposium on Optical Materials for High-Power Lasers 2004  
DOI
10.1117/12.584743
Language
English
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
Keyword(s)
  • scattering

  • thin film

  • coating

  • DUV

  • microlithography

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